or plasma etching, which uses RF energy to generate a reactive plasma from an etching gas. Isotropic vs. anisotropic etching. Most wet etching methods are isotropic to some degree, which can lead ...

What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...

and the ions are expedited toward the surface to generate a highly powerful anisotropic etch. Using a wafer-level RF source, gas penetrates the top of the chamber, where it is transformed into a ...

AlixLabs AB, a Swedish semiconductor startup specialising in Atomic Layer Etching (ALE), announces that it has entered a ...

Challenges like higher selectivity and precise etching are critical for angstrom-scale IC production. Advanced RF pulsing and plasma control enhance precision in sub-nanometer processes.

Substrate DC bias is determined by a separate RF generator, enabling independent control of radicals ... and outstanding uniformity with clean smooth vertical profiles and etch surfaces. The systems ...