Research has shown that inserting a tantalum (Ta) interlayer can significantly improve both the contact resistivity and thermal stability of the TiSi 2 /Si interface. This method has resulted in a ...

Tantalum is a metal in group VB of the periodic table with atomic number 73, an atomic weight of 180.95, and a density of 16.6 Mg/m 3. Its melting point is 2996 C, and it boils at 5425 C. In the solid ...