The motivation for using plasma etching and the advantages of this dry etching technique over wet etching are discussed. Principal reactor designs are described and key VLSI materials involved in ...
In a conventional plasma etching chamber, the incident ions bombard ... on rough and irregular surfaces in practice. Nevertheless, dry adhesives have numerous applications in nanoelectronics ...
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An alternate innovation: manufacturers could use a resist-patterned hard mask to define the via dimensions and then dry etch the build-up film on the copper surface of the previously patterned RDL.