LPKF´s state of the art Laser Induced Deep Etching (LIDE) technology finally enables a damage-free technique to cut and drill a wide variety of transparent glass types such as alumino-borosilicate ...
As manufacturers face increasing pressure to deliver high-performance, complex components with minimal lead times, ...
This groundbreaking technique, also referred to as MacEtch or MACE, provides ultra-high anisotropy etching that’s free from damage. It is an innovative approach that effectively addresses the ...
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Plasma technique doubles etch rate for 3D NAND flash memoryTo store ever more data in electronic devices of the same size, the manufacturing processes for these devices need to be ...
To improve data storage, researchers are perfecting 3D NAND flash memory, which stacks cells to maximize space. Researchers ...
Discover how photo chemical etching ensures burr-free surgical instruments with unmatched precision. Read more now!
Goertek Optics Technology Co. ("Goeroptics"), a subsidiary of Goertek, has unveiled its latest full-color augmented reality (AR) etching waveguide module, Star G-E1, and its proprietary DLP (Digital ...
As part of the APECS pilot line, the area of dry etching technology in the Fraunhofer IAF clean room for 6’’ wafers is being expanded.
The Global Etch Process Market was valued at approximately USD $$ billion in 2022 and is projected to grow at a healthy CAGR of more than $% during the forecast period 2023-2030.
ALE of MoS 2 shows no Raman defect peak after etching, highlighting the low damage etching capabilities of ALE. Image Credit: Oxford Instruments Plasma Technology 25 nm wide Si trenches etched to 110 ...
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