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Atomic Layer Deposition (ALD) is a highly controlled technique used to create thin films, particularly silicon nitride (SiNx), which is essential in various microelectronic applications.

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The carbon nitride transfers electron density to the water, forming a hybrid system. "From this point on, the water and the catalyst act as a new, hybrid semiconductor.

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National Engineering Research Center of Nonferrous Metals Materials and Products for New Energy, CHINA GRINM Group Co., Ltd., Beijing 100088, China GRIMAT Engineering Institute Co., Ltd., Beijing ...

What’s New About the Design? The breakthrough isn’t in the material itself, but in how it’s structured. Dr. Edison Ang’s team created a Janus homojunction, a new way of arranging the layers of carbon ...

Jenna Igneri is a fashion and beauty writer who has worked in the media space for over a decade. In addition to contributing to InStyle, she’s held positions at Refinery29 and NYLON and has ...

Learn more When I moved from the east coast to the Rocky Mountains years ago, I simply did not understand how to layer for warmth. I wore cotton long sleeves and was toasty when I stepped outside ...