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    A Detailed Study of Semiconductor Wafer Drying - ScienceDirect

    • In this chapter, the performance of several drying techniques commonly used in the semiconductor manufacturing industry is evaluated. This is done by measuring the residues on a wafer onto which a soluti… 展开

    19.1. Introduction

    19.1.1. Scope
    In almost every industry, manufacturing steps can be found where a solid is b… 展开

    ScienceDirect
    19.2. Theoretical Background

    The theoretical background needed for a correct interpretation of the salt residue tests (introduced in Section 19.1.2) is given here. It consists of some physical, chemical, and m… 展开

    ScienceDirect
    19.3. Experimental Details

    19.3.1. Setups for Wafer Drying
    In this section, an overview of the various drying platforms used in this work is given. They can be divided into spin drying platforms and su… 展开

    ScienceDirect
    19.6. Summary and Conclusions

    In this work, the performance of several drying techniques commonly used in the semiconductor manufacturing industry is evaluated. This is done by measuring the residues on a wa… 展开

    ScienceDirect
    References

    1.
    W. Fyen, K. Xu, R. Vos, G. Vereecke, P.W. Mertens, M.M. Heyns
    Particle Deposition under Transient pH Conditions durin… 展开

    ScienceDirect
    How do you Dry a wafer?
    Drying of the wafer is accomplished by first positioning both nozzles over the center of the wafer and subsequently moving both nozzles at the same speed toward the edge of the wafer. The advantage of this technique is that the rotation speed is significantly lower than in the case of spin drying.
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    目录
    19.1. Introduction
    19.2. Theoretical Background
    19.3. Experimental Details
    19.6. Summary and Conclusions
    References
    How do you Dry a wafer?